HAP Semi Hap

Semi Exposure System


Highlights

  • High performance
  • High productivity
  • High resolution down to 25 µm
  • Template function
  • Top light system (Option)
  • Temperature and humidity controller
  • Collimated light source
         Intensity >= 25 mW/cm2
         Uniformity >= 90%
         Collimated half angle <= 1,5¡


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HAP Semi Hap

Semi automatic exposure system with excellent registration and high resolution down to 25 µm.


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