Due to 288 parallel working Blue-Ray laser diodes the expose is performed in 288 parallel segments. Thus the data can be processed in parallel too. The single light beams supply high energy but do not overstress the exposed resist. High throughput is the result also with resists which need higher energies like solder masks.

Contact Exposure System with Film Mask Scaling Mechanism. Exposure Systems with unique Mask Scaling Mechanism for Solder Resist and Dry Film resist.

Very compact double sided fully automated collimated exposure system including independent artwork scaling for an overall registration accuracy of +/- 5 μm in reference to drill picture.

Most common cut sheet laminator in the world with high performance through patented V-pressure system.

Manual double sided differential pressure laminator with high performance especially for applications with high topographic surfaces.